Taking the Leap to 7nm: Risk or Reward? - Article - ANSYS Advantage - V11 I2

Benefiting from the advances in semiconductor process node improvements is no easy feat. A host of design challenges and risks accompany every new generation of process nodes. The 7nm node is by far the most advanced available today from all leading foundries. This process node fundamentally challenges the basic assumptions on margin-based design. At the same time, it also pushes the boundaries on power and performance benefits that are available to designers. With the 7nm node being the industry driver for the near future, designers are fundamentally rethinking their design implementation strategies using upfront simulations.